Niobium Sputtering Target
Niobium Sputtering Target

Niobium Sputtering Target

Material:Pure niobium, Nb Alloys
Grade:R04200, R04210
Standard:ASTM B392, ASTM B393
Sizes:Customized
Density:8.57 g/cm3
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introduction

 

Niobium sputtering targets (Nb Targets) are high-purity niobium materials used for thin film deposition in fuel cells, semiconductors, LEDs, displays, photovoltaic devices, decorative coatings, and glass coatings.

 

specification

 

Property Description
Material Pure Niobium, Nb Alloys
Symbol Nb
Atomic Number 41
Atomic Weight 92.90637
Melting Point 2468 °C
Element Category Transition Metal
Grade R04200, R04210
Standard ASTM B392, ASTM B393
Density 8.57 g/cm³
Sizes Customized
Forms Round/Square Discs
Applications Fuel cells, semiconductors, displays, LED & photovoltaic devices, glass coating, decoration
Key Features High purity, excellent ductility, corrosion-resistant, customizable sizes and shapes

 

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Customizable Options

 

Size and Shape: Custom diameters, thicknesses, and shapes such as discs or squares are available upon request.

Grades: Available in various grades, including R04200 and R04210.

Surface Treatment: Polished, roughness-controlled, or custom coatings are available upon request.

 

quality control

 

Material Purity
We ensure every batch of raw material is high-purity and contaminant-free, verified with X-ray, ICP, and GDMS analysis, giving you consistent performance.

 

Dimensional Accuracy
All targets are precisely measured with CMM, optical profilometry, and laser scanning to meet your exact size and shape requirements.

 

Surface Finish
We check surface smoothness and roughness using SEM, AFM, and optical microscopy to guarantee uniform thin film deposition.

 

Damage and Contamination Inspection
Each target is inspected for cracks, dirt, or transport damage, with visual checks, leak tests, and vacuum-sealed packaging to ensure it arrives safely and ready to use.


Our comprehensive QC ensures every sputtering target delivers stable, long-lasting performance.

 

certification

 

We manufacture under strict quality controls to international standards, including ISO 9001, ensuring reliability and consistent performance.

 

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The Advantage of Choosing Us

 

Extensive Industry Experience

With over 20 years of experience, KOBO has deep expertise in metal processing and a proven track record of supplying high-quality refractory and reactive metals worldwide.

 

Strong Manufacturing Base

KOBO operates two production plants in Baoji, ensuring stable quality and large-scale supply to meet bulk orders.

 

Advanced Equipment

Equipped with VAR (Vacuum Arc Remelt) and EB (Electron Beam) melting furnaces, KOBO can produce metals with superior purity, uniformity, and mechanical properties.

 

Wide Product Range

KOBO offers a full spectrum of refractory and reactive metals (titanium, vanadium, niobium, tantalum, molybdenum, tungsten, hafnium, zirconium, nickel) and their alloys, suitable for industrial, medical, aerospace, and electronic applications.

 

FAQ

Q: What is a Niobium Sputtering Target?

A: A Niobium Sputtering Target is a high-purity niobium material used in physical vapor deposition (PVD) to deposit thin films for applications like semiconductors, LEDs, photovoltaic devices, and decorative coatings.

Q: What materials are used for Niobium Sputtering Targets?

A: Niobium Sputtering Targets are made from pure niobium or niobium alloys, typically with grades R04200 or R04210, and can be customized according to application requirements.

Q: What sizes and forms are available?

A: The targets can be supplied in various sizes and shapes, including round and square discs, and dimensions can be customized according to your specifications.

Q: What are the key features of Niobium Sputtering Targets?

A: They offer high purity, uniform microstructure, excellent corrosion resistance, good thermal stability, and consistent sputtering performance.

Q: What applications are Niobium Sputtering Targets commonly used for?

A: They are widely used in fuel cells, semiconductor devices, LED and photovoltaic technology, display coatings, glass coatings, and other high-tech thin-film deposition applications.

 

 

 

 

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