Bismuth Sputtering Targets (Bi)

Sputtering targets are necessary raw materials used in physical vapor deposition thin film coating. Sputtering deposition, or sputter coating, is one of the PVD technology. During the coating processes, the sputtering target particles are ejected from a solid sputtering material due to bombardment of the target by energetic particles. It is an electronic process that deposits thin films of metals or other materials onto a variety of surfaces.

KOBO has a long and rich experience for all forms of metal sputtering targets production as a senior manufacturer for Pure Metal Sputtering Targets and Alloy Sputtering Targets.

Metal sputtering targets are usually made of highly pure metals, are widely used, and fundamental coating materials for other sputter deposition technology. We offer metal targets in various purity levels to suit customers' specific requirements, with a minimum purity of 99.95% up to 99.99% .

Metallic Bismuth (Bi) target,also magnetron sputtering material, atomic number 83, is a red-white metal, density of 9.8g/cm³, melting point of 271.3℃, boiling point of 1560℃. Bismuth has metallic luster, brittleness, poor electrical and thermal conductivity, and is also a strong diamagnetic metal, which increases the electrical resistivity and decreases the thermal conductivity under the action of a magnetic field. Except for mercury, bismuth is a metal with low thermal conductivity. Bismuth and its alloys have a thermoelectric effect. Bismuth increases in volume during solidification, with an expansion rate of 3.3%. For example, it is used in lead-free solder, and even in medicines and cosmetics. In addition, bismuth is also used in alloy smelting, and it is also one of the ideal superconducting materials, and bismuth has applications in batteries, semiconductors and nuclear industry materials.

Bismuth sputtering target is available in various forms, purities, sizes, and prices. KOBO is your one-stop source to find bismuth sputter targets for sale.

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