introduction
Hafnium sputtering targets are high-purity materials used for thin film deposition in semiconductor, display, and industrial applications.
specification
| Property | Specification |
|---|---|
| Material Type | Hafnium |
| Symbol | Hf |
| Color / Appearance | Gray Steel, Metallic |
| Melting Point | 2227 °C |
| Density | 13.31 g/cc |
| Sputter | DC |
| Type of Bond | Indium, Elastomer |
| Purity | 3N5 |
| Shapes | Flat target, Custom shapes |
| Sizes | Customized per drawings |
| Key Features | High purity, Excellent thermal conductivity, Mechanical strength, Chemical stability, Customizable shapes & sizes |
| Applications | Semiconductor thin film deposition (Si, SiN, Al₂O₃, ZrO₂), Display transparent electrodes (ITO, ZnO), Industrial thin film materials. |
customization
Size and Thickness: Custom thickness, diameter, length, and overall dimensions are available based on customer drawings or specifications.
Shape: In addition to standard flat targets, we can also customize round, square, special-shaped, or specialized targets.
Purity: Standard purity is 3N5 (99.95%), with higher purity levels available upon request.
Surface Treatment: Customizable surface roughness or polishing is available.
Bonding: We can choose from various bonding methods, such as indium or elastomer, based on equipment requirements.
Quality Control
Material Purity
We ensure every batch of raw material is high-purity and contaminant-free, verified with X-ray, ICP, and GDMS analysis, giving you consistent performance.
Dimensional Accuracy
All targets are precisely measured with CMM, optical profilometry, and laser scanning to meet your exact size and shape requirements.
Surface Finish
We check surface smoothness and roughness using SEM, AFM, and optical microscopy to guarantee uniform thin film deposition.
Damage and Contamination Inspection
Each target is inspected for cracks, dirt, or transport damage, with visual checks, leak tests, and vacuum-sealed packaging to ensure it arrives safely and ready to use.
Our comprehensive QC ensures every sputtering target delivers stable, long-lasting performance.
certification
We manufacture under strict quality controls to international standards, including ISO 9001, ensuring reliability and consistent performance.
FAQ
Q: What is Hafnium Sputtering Target (Hf) and what is it used for?
A: Hafnium Sputtering Targets are high-purity Hf metal materials used in physical vapor deposition (PVD) for thin film coating. They are widely applied in semiconductor manufacturing, display devices, and thin film materials like oxides, nitrides, silicides, and metals.
Q: What forms and sizes of Hafnium Sputtering Targets are available?
A: Hafnium Targets are available in flat, round, square, and custom shapes. Sizes can be customized according to drawings or specific requirements.
Q: How is the surface of Hafnium Targets prepared?
A: The surface can be polished or treated to achieve the desired roughness, ensuring uniform thin film deposition during sputtering.
Q: What bonding methods are available for Hafnium Sputtering Targets?
A: Hafnium Targets can be bonded using Indium or Elastomer, depending on the sputtering equipment requirements.
Q: Can Hafnium Sputtering Targets be customized for specific applications?
A: Yes, Hafnium Targets can be customized in shape, size, purity, surface finish, and bonding method to suit various PVD processes and device specifications.
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