introduction
Nickel Sputtering Targets (Ni) are high-purity nickel metallic targets used in PVD thin film deposition for applications in decorative coatings, semiconductors, LEDs, photovoltaic devices, optical coatings, and glass treatments.
specification
| Property | Details |
|---|---|
| Material Type | High-purity Nickel |
| Symbol | Ni |
| Color/Appearance | Lustrous silvery-white metal with a slight golden tinge |
| Melting Point | 1455 °C |
| Density | 8.91 g/cc |
| Sputter Type | DC |
| Type of Bond | Indium, Elastomer |
| Purity | 99.95% – 99.99% |
| Applications | Thin film deposition, decorative coatings, semiconductor devices, LED, photovoltaic devices, functional coatings, glass coatings, optical communication |
| Key Features | Ductile and malleable; Ferromagnetic; Polished surface maintains luster in air; High density |
| Advantages | Provides stable thin film deposition, long target life, consistent surface quality, and excellent compatibility with a variety of PVD systems |
Customization Options
Form & Shape: Circular, rectangular, or custom designs per customer drawing
Dimensions: Thickness, diameter, and size tailored to specifications
Purity Levels: Standard 99.95% up to high purity 99.99%
Bonding Options: Indium or elastomer bonding available
Surface Finish: Polished, matte, or as required
Quality Control
Material Purity
We ensure every batch of raw material is high-purity and contaminant-free, verified with X-ray, ICP, and GDMS analysis, giving you consistent performance.
Dimensional Accuracy
All targets are precisely measured with CMM, optical profilometry, and laser scanning to meet your exact size and shape requirements.
Surface Finish
We check surface smoothness and roughness using SEM, AFM, and optical microscopy to guarantee uniform thin film deposition.
Damage and Contamination Inspection
Each target is inspected for cracks, dirt, or transport damage, with visual checks, leak tests, and vacuum-sealed packaging to ensure it arrives safely and ready to use.
Our comprehensive QC ensures every sputtering target delivers stable, long-lasting performance.
Certifications
Our Nickel Sputtering Targets are produced under strict ISO 9001 quality management standards, ensuring consistent performance, traceability, and reliability for industrial and research applications.
FAQ
Q: What are Nickel Sputtering Targets used for?
A: Nickel sputtering targets are used for thin film deposition, decorative coatings, semiconductor devices, LEDs, photovoltaic devices, glass coatings, and optical communication, providing reliable and uniform films.
Q: What materials and purities are available?
A: Our targets are made of high-purity nickel metal, with purity levels from 99.95% to 99.99%, ensuring stable deposition and minimal contamination.
Q: Can Nickel Sputtering Targets be customized?
A: Yes. We offer custom shapes, sizes, thicknesses, bonding types (Indium or Elastomer), and surface finishes to meet your exact production requirements.
Q: How is the surface finish of the targets ensured?
A: The surface is carefully inspected for smoothness and roughness using SEM, AFM, and optical microscopy, guaranteeing uniform sputtering and high-quality thin films.
Q: What sputtering method is compatible with Nickel targets?
A: Our Nickel targets are mainly used for DC sputtering, but can also be adapted for other PVD processes depending on system requirements.
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