introduction
Titanium sputtering targets are high-purity titanium materials used in physical vapor deposition (PVD) for thin film coatings in applications such as semiconductor components, flat displays, decorative coatings, and hardware tool surfaces.
specification
| Property | Details |
|---|---|
| Material Type | Titanium |
| Symbol | Ti |
| Color/Appearance | Silvery Metallic |
| Melting Point | 1,660 °C |
| Density | 4.5 g/cc |
| Sputter | DC |
| Type of Bond | Indium, Elastomer |
| Features | High purity, high density, high strength, corrosion-resistant (resistant to oxidation, chloride corrosion, and mild acids/bases) |
| Applications | Hardware tool coating, decorative coating, semiconductor components, flat panel display coating, optical coatings, optoelectronic devices, superalloys, conductive materials, chemical catalysts, medical equipment |
Customizable Options
Size and dimensions according to drawings
Purity levels (e.g., 99.95%, 99.99%)
Target shapes (flat, custom-shaped)
Bonding types (Indium, Elastomer)
Quality Control
Material Purity
We ensure every batch of raw material is high-purity and contaminant-free, verified with X-ray, ICP, and GDMS analysis, giving you consistent performance.
Dimensional Accuracy
All targets are precisely measured with CMM, optical profilometry, and laser scanning to meet your exact size and shape requirements.
Surface Finish
We check surface smoothness and roughness using SEM, AFM, and optical microscopy to guarantee uniform thin film deposition.
Damage and Contamination Inspection
Each target is inspected for cracks, dirt, or transport damage, with visual checks, leak tests, and vacuum-sealed packaging to ensure it arrives safely and ready to use.
Our comprehensive QC ensures every sputtering target delivers stable, long-lasting performance.
certification
We manufacture under strict quality controls to international standards, including ISO 9001, ensuring reliability and consistent performance.
FAQ
Q: What is a Titanium Sputtering Target?
A: Titanium Sputtering Target is a high-purity titanium material used for physical vapor deposition (PVD) to produce thin films in semiconductors, optical coatings, displays, and decorative applications.
Q: What makes Titanium Sputtering Targets corrosion-resistant?
A: They are resistant to oxidation, chloride corrosion (e.g., in marine environments), and mild acids and bases, making them durable in harsh conditions.
Q: Can Titanium Sputtering Targets be customized?
A: Yes, we can provide customized sizes, shapes, purity levels, and bonding types according to customer requirements.
Q: What are the main physical properties of Titanium Sputtering Targets?
A: They have high density, high strength, high melting point, excellent thermal conductivity, and a silvery metallic appearance.
Q: How do Titanium Targets perform in semiconductor manufacturing?
A: They provide high-purity metal for PVD processes, enabling consistent thin film deposition on semiconductor substrates.
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