Zinc Sputtering Targets (Zn)
Zinc Sputtering Targets (Zn)

Zinc Sputtering Targets (Zn)

Material Type:Zinc
Symbol:Zn
Color/Appearance:Bluish Pale Gray, Metallic
Melting Point:420 °C
Density:7.14 g/cc
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introduction

 

Zinc sputtering targets are high-purity zinc materials used in physical vapor deposition (PVD) thin film coatings, widely applied in semiconductors, optical coatings, LEDs, display panels, and decorative films for reliable and uniform deposition.

 

specification

 

Property Details
Material Type Pure Zinc, Zinc Alloys
Symbol Zn
Color/Appearance Silvery-white metallic
Melting Point 419.5 °C
Density 7.14 g/cm³
Sputtering Method DC / RF (depending on application)
Type of Bond Indium, Elastomer
Purity 99.95% – 99.99%
Applications Semiconductor devices, optical coatings, LEDs, display panels, decorative films
Key Features High purity; uniform microstructure; good thermal conductivity; non-magnetic; low stress and low contamination; excellent compatibility with PVD processes; corrosion-resistant under standard storage conditions

 

Customization Options

 

Dimensions & Shapes: Customized according to your drawings or specifications.

Bonding Methods: Indium bonding or elastomer bonding as required.

Surface Finish: Polished or customized finish to ensure uniform thin film deposition.

 

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Quality Control 

 

Material Purity
We ensure every batch of raw material is high-purity and contaminant-free, verified with X-ray, ICP, and GDMS analysis, giving you consistent performance.

 

Dimensional Accuracy
All targets are precisely measured with CMM, optical profilometry, and laser scanning to meet your exact size and shape requirements.

 

Surface Finish
We check surface smoothness and roughness using SEM, AFM, and optical microscopy to guarantee uniform thin film deposition.

 

Damage and Contamination Inspection
Each target is inspected for cracks, dirt, or transport damage, with visual checks, leak tests, and vacuum-sealed packaging to ensure it arrives safely and ready to use.


Our comprehensive QC ensures every sputtering target delivers stable, long-lasting performance.

 

certification

 

We manufacture under strict quality controls to international standards, including ISO 9001, ensuring reliability and consistent performance.

 

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FAQ

Q: What are Zinc Sputtering Targets used for?

A: Zinc sputtering targets are used in physical vapor deposition (PVD) thin film coatings, widely applied in semiconductors, optical coatings, LEDs, display panels, and decorative films for uniform and high-quality films.

Q: Can Zinc Sputtering Targets be customized?

A: Yes. We provide custom dimensions, thicknesses, bonding methods (Indium or Elastomer), and surface finishes according to customer drawings or specifications.

Q: What are the key features of Zinc Sputtering Targets?

A: Key features include high purity, uniform microstructure, good thermal conductivity, non-magnetic properties, low stress, and corrosion resistance, making them suitable for precision coating applications.

Q: How is the quality of Zinc Sputtering Targets ensured?

A: All targets undergo strict inspection for material purity, dimensions, surface finish, and contamination, complying with ISO and ASTM standards for reliable performance.

Q: What sputtering methods are compatible with Zinc targets?

A: Zinc targets are compatible with DC and RF sputtering systems, and can be adapted to most PVD coating processes.

 

 

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