Vanadium Sputtering Targets (V)
Vanadium Sputtering Targets (V)

Vanadium Sputtering Targets (V)

Material Type:Vanadium Symbol:V Color/Appearance:Silvery Gray Metallic Melting Point:1890 °C Density:5.96 g/cc
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introduction

 

Vanadium Sputtering Targets are high-purity vanadium metal used as a thin film material in integrated circuits, surface coatings, and solar, electronic, and semiconductor applications.

 

specification

 

Property Details
Material Type Vanadium
Symbol V
Color / Appearance Silvery Gray Metallic
Melting Point 1890 °C
Density 5.96 g/cc
Sputter DC
Type of Bond Indium, Elastomer
Applications Integrated circuits, surface coatings, solar film batteries, electronics, semiconductors, and construction glass
Features High melting point; good corrosion resistance (stable against alkalis, sulfuric acid, hydrochloric acid); medium-hard, ductile; can withstand large current density; good plasticity for rolling, foils, and wires

 

Customizable Options

 

Size and thickness of targets

Shape: flat, round, or custom-shaped

Purity: up to 99.99%

Alloy composition (e.g., NiV)

 

3001001
11001001

Quality Control

 

Material Purity
We ensure every batch of raw material is high-purity and contaminant-free, verified with X-ray, ICP, and GDMS analysis, giving you consistent performance.

 

Dimensional Accuracy
All targets are precisely measured with CMM, optical profilometry, and laser scanning to meet your exact size and shape requirements.

 

Surface Finish
We check surface smoothness and roughness using SEM, AFM, and optical microscopy to guarantee uniform thin film deposition.

 

Damage and Contamination Inspection
Each target is inspected for cracks, dirt, or transport damage, with visual checks, leak tests, and vacuum-sealed packaging to ensure it arrives safely and ready to use.


Our comprehensive QC ensures every sputtering target delivers stable, long-lasting performance.

 

Products Description

 

We manufacture under strict quality controls to international standards, including ISO 9001, ensuring reliability and consistent performance.

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product-1000-1417

FAQ

Q: What is a Vanadium Sputtering Target?

A: Vanadium Sputtering Targets are high-purity vanadium metals used as thin film materials for integrated circuits, coatings, and electronic applications.

Q: Can Vanadium Targets be used in solar cell applications?

A: Yes, especially NiV alloy targets are widely used in solar film batteries.

Q: Are Vanadium Sputtering Targets resistant to chemical corrosion?

A: Yes, they are stable against alkalis, sulfuric acid, and hydrochloric acid.

Q: Can Vanadium Targets be supplied as alloys?

A: Yes, alloy targets such as NiV are available for specific functional coatings.

Q: How does Vanadium perform under high current density in sputtering?

A: Vanadium has a high melting point and excellent thermal stability, making it suitable for high-current-density deposition processes.

 

 

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