introduction
Molybdenum Sputtering Target is a high-purity metal target used in physical vapor deposition (PVD) processes to create thin films for electronics, optics, and medical imaging applications.
specification
| Property | Details |
|---|---|
| Material Type | Pure Molybdenum |
| Symbol | Mo |
| Color / Appearance | Grey, Metallic |
| Melting Point | 2,617 °C |
| Density | 10.2 g/cm³ |
| Sputter Type | DC |
| Bonding Options | Indium Bonding, Elastomer Bonding |
| Forms | Planar Targets, Circular Targets, Custom Shapes |
| Purity | ≥99.95% (up to 99.99% available) |
| Standard | ASTM or per customer specification |
| Applications | Thin-film deposition, X-ray imaging, semiconductor processing, scientific research |
Features
High Purity: Up to 99.99% purity ensures stable film performance
High Density: Approaching the theoretical density of 10.22 g/cm³, improving film deposition efficiency
Uniform Microstructure: Ensures uniform erosion during sputtering, improving film consistency
Small Average Grain Size: Ensures target uniformity and reduces film defects
Excellent Thermal Conductivity: Prevents localized overheating during sputtering
Low Coefficient of Thermal Expansion: Maintains structural stability even in high-temperature environments
High Strength and Hardness: Ensures wear resistance and long target life during sputtering
Customization Options
We offer fully customizable molybdenum sputtering targets to meet diverse project needs:
Size & Shape: Diameter, thickness, and shape per drawing
Form: Planar, circular, rectangular, or custom geometries
Bonding Type: Indium bonding or elastomer bonding
Surface Finish: Polished or matte as requested
Additional Processing: Cutting, machining, and bonding services available
certification
Manufactured under strict quality systems and compliant with international standards, including ISO 9001, ensuring consistent quality and traceability.
Reasons to Work with Us
Extensive Industry Experience
With over 20 years of experience, KOBO has deep expertise in metal processing and a proven track record of supplying high-quality refractory and reactive metals worldwide.
Strong Manufacturing Base
KOBO operates two production plants in Baoji, ensuring stable quality and large-scale supply to meet bulk orders.
Advanced Equipment
Equipped with VAR (Vacuum Arc Remelt) and EB (Electron Beam) melting furnaces, KOBO can produce metals with superior purity, uniformity, and mechanical properties.
Wide Product Range
KOBO offers a full spectrum of refractory and reactive metals (titanium, vanadium, niobium, tantalum, molybdenum, tungsten, hafnium, zirconium, nickel) and their alloys, suitable for industrial, medical, aerospace, and electronic applications.
FAQ
Q: What bonding options are available for molybdenum targets?
A: We offer both indium bonding and elastomer bonding, depending on your sputtering system requirements.
Q: What industries use molybdenum sputtering targets?
A: They are widely used in medical imaging, semiconductors, optics, material science, and research institutions.
Q: How is the bonding of the molybdenum target achieved?
A: For large-area coating systems, molybdenum targets can be bonded to a backing plate using indium or elastomer bonding to improve thermal conductivity and prevent cracking during sputtering.
Q: What is the advantage of using molybdenum targets compared to other materials?
A: Molybdenum offers a high melting point (2,620°C), low vapor pressure, excellent mechanical strength, and good thermal conductivity, making it highly reliable for stable thin-film deposition.
Q: How should molybdenum sputtering targets be stored and handled?
A: Targets should be stored in a dry, clean environment, preferably in vacuum-sealed packaging. Handling should avoid direct contact with bare hands to prevent contamination.
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