introduction
Tantalum sputtering targets are high-purity tantalum materials used in physical vapor deposition (PVD) thin film coatings, widely applied in electronics, flat panel displays, optical coatings, decorative films, and glass coating industries.
specification
| Property | Details |
|---|---|
| Material Type | Pure Tantalum |
| Symbol | Ta |
| Color/Appearance | Blue-gray metallic |
| Melting Point | 3,017 °C |
| Density | 16.6 g/cm³ |
| Sputtering Method | DC |
| Type of Bond | Indium, Elastomer |
| Purity | 99.95% – 99.99% |
| Applications | Electronics, flat panel displays, optical coatings, CD-ROMs, decorative films, car glass, architectural glass, optical communication |
| Key Features | High melting point, low vapor pressure, excellent corrosion resistance, good cold working performance, chemical stability, non-magnetic, strong resistance to liquid metal corrosion, uniform microstructure for stable sputtering |
Customization Options
Dimensions & Shapes: Produced according to customer drawings or specifications.
Bonding Methods: Indium bonding or elastomer bonding as required.
Surface Finish: Polished or customized to ensure uniform thin film deposition.
quality control
Material Purity
We ensure every batch of raw material is high-purity and contaminant-free, verified with X-ray, ICP, and GDMS analysis, giving you consistent performance.
Dimensional Accuracy
All targets are precisely measured with CMM, optical profilometry, and laser scanning to meet your exact size and shape requirements.
Surface Finish
We check surface smoothness and roughness using SEM, AFM, and optical microscopy to guarantee uniform thin film deposition.
Damage and Contamination Inspection
Each target is inspected for cracks, dirt, or transport damage, with visual checks, leak tests, and vacuum-sealed packaging to ensure it arrives safely and ready to use.
Our comprehensive QC ensures every sputtering target delivers stable, long-lasting performance.
certification
We manufacture under strict quality controls to international standards, including ISO 9001, ensuring reliability and consistent performance.
Our Strengths
Extensive Industry Experience
With over 20 years of experience, KOBO has deep expertise in metal processing and a proven track record of supplying high-quality refractory and reactive metals worldwide.
Strong Manufacturing Base
KOBO operates two production plants in Baoji, ensuring stable quality and large-scale supply to meet bulk orders.
Advanced Equipment
Equipped with VAR (Vacuum Arc Remelt) and EB (Electron Beam) melting furnaces, KOBO can produce metals with superior purity, uniformity, and mechanical properties.
Wide Product Range
KOBO offers a full spectrum of refractory and reactive metals (titanium, vanadium, niobium, tantalum, molybdenum, tungsten, hafnium, zirconium, nickel) and their alloys, suitable for industrial, medical, aerospace, and electronic applications.
FAQ
Q: What are Tantalum Sputtering Targets used for?
A: Tantalum sputtering targets are widely used in electronics, flat panel displays, optical coatings, decorative films, CD-ROMs, automotive and architectural glass, and optical communication devices for high-precision thin film deposition.
Q: Can Tantalum Sputtering Targets be customized?
A: Yes. We provide custom shapes, sizes, bonding methods (Indium or Elastomer), and surface finishes according to your drawings or specifications.
Q: What are the key features of Tantalum Sputtering Targets?
A: Key features include high melting point, low vapor pressure, excellent corrosion resistance, good cold working performance, chemical stability, non-magnetic properties, and uniform microstructure for reliable thin film coating.
Q: How is the quality of Tantalum Sputtering Targets ensured?
A: All targets undergo strict inspection for material purity, dimensions, surface finish, and contamination, complying with ISO and ASTM standards for consistent and reliable performance.
Q: What sputtering methods are compatible with Tantalum Targets?
A: Tantalum targets are compatible with DC sputtering systems and can be adapted to most PVD coating processes.
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