Niobium Sputtering Targets (Nb)
Niobium Sputtering Targets (Nb)

Niobium Sputtering Targets (Nb)

Material Type:Niobium
Symbol:Nb
Color/Appearance:Gray, Metallic
Melting Point:2,468 °C
Density:8.57 g/cc
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introduction

 

Niobium Sputtering Targets are high-purity Nb materials used in physical vapor deposition (PVD) for thin film coating, widely applied in LCD, flat panel displays, optical coatings, solar cells, and decorative or protective coatings.

 

specification

 

Property Details
Material Type Niobium
Symbol Nb
Color/Appearance Gray, Metallic
Melting Point 2,468 °C
Density 8.57 g/cc
Sputter DC
Type of Bond Indium, Elastomer
Purity ≥ 99.95%
Grain Structure Small grain, good recrystallization, uniform triaxial consistency
Forms Flat targets, custom shapes
Applications Chemical industry, LCD, flat panel display, optical coating, thin film solar, low radiation glass, high-conductivity and corrosion-resistant coatings, decorative coating
Features Forms a stable oxide layer, corrosion-resistant, uniform oxide film, high conductivity, heat-resistant

 

customization

 

Shapes: flat, round, square, or custom

Sizes: according to customer drawings

Purity: ≥ 99.95%, can be customized for higher purity

Surface finish: polished or treated for uniform sputtering

Bonding type: Indium or Elastomer

 

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Quality Control

 

Material Purity
We ensure every batch of raw material is high-purity and contaminant-free, verified with X-ray, ICP, and GDMS analysis, giving you consistent performance.

 

Dimensional Accuracy
All targets are precisely measured with CMM, optical profilometry, and laser scanning to meet your exact size and shape requirements.

 

Surface Finish
We check surface smoothness and roughness using SEM, AFM, and optical microscopy to guarantee uniform thin film deposition.

 

Damage and Contamination Inspection
Each target is inspected for cracks, dirt, or transport damage, with visual checks, leak tests, and vacuum-sealed packaging to ensure it arrives safely and ready to use.


Our comprehensive QC ensures every sputtering target delivers stable, long-lasting performance.

 

certification

 

We manufacture under strict quality controls to international standards, including ISO 9001, ensuring reliability and consistent performance.

 

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FAQ

Q: What are Niobium Sputtering Targets used for?

A: Niobium sputtering targets are used in physical vapor deposition (PVD) to deposit thin films for applications like LCDs, flat panel displays, optical coatings, solar cells, and decorative or protective coatings.

Q: What shapes and sizes are available?

A: We offer flat, round, and square targets, as well as custom shapes and sizes according to your drawings or specific requirements.

Q: What are the key features of Niobium Sputtering Targets?

A: They form a stable protective oxide layer, are highly corrosion-resistant, heat-resistant, and provide excellent conductivity for thin film applications.

Q: Can the bonding type be customized?

A: Yes, niobium targets can be supplied with Indium bonding or elastomer bonding based on the sputtering system requirements.

Q: Which industries commonly use Niobium Sputtering Targets?

A: They are widely used in the chemical industry, display technologies (LCD, flat panels), solar and optical coatings, low-radiation glass, and decorative or high-conductivity coatings.

 

 

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